Electron-ion-plasma boriding of a multilayer nanostructural high-entropy alloy

The structure and properties of a high-entropy alloy (HEA) subjected to saturation with boron atoms by combined electron-ion-plasma method are characterized. On HEA film 5 ?m thickness deposited on AISI 304 steel, (boron + chromium) 1 was then the system “(Cr B) / (HEA steel) substrate” irradiated pulsed electron beam. It is shown that wear resistance resulting more than 30 times higher original film. microhardness 10.5 % in initial state. has been revealed irradiation beam leads formation multi-element surface composition (at.%) 5.8Al-11.6Ti-12.9Cr-13.0Fe-2.4Ni-13.1Cu-10.4Zr-8.8Nb, rest (22 at.%) oxygen boron. Thus, seven-element non-stoichiometric composition, concentration metal elements which varies within (5.8 –13.0) at.%, additionally containing nickel, formed. established high tribological strength due multiphase submicron-nanocrystalline high-speed cellular crystallization modified layer 6 µm thick. High-speed accompanied delamination extended interlayers enriched copper located along boundaries cells.